Fully Sponsored | Conducted in English | Now Open for Registration
One camp – 16 advanced STEM fields
Learn at the heart of global innovation and choose a topic that matches your passion.
BISS International Summer Program
One of China’s top universities, known for its strong focus on aerospace, engineering, and advanced technology. Excels in fields like AI, computer science, materials, and biomedical engineering.
University: BISS University (Hangzhou)
Gain new knowledge, global exposure & international network
Experience Chinese culture & innovation hubs
The summer camp program will take place near the Liangzhu Archaeological Site in Hangzhou, Zhejiang Province — a 5,300-year-old city and a UNESCO World Heritage Site.
Beihang University, a leading institution in China for Aeronautics and a pioneer in cutting-edge technologies such as AI, quantum tech, and space exploration, is hosting an exclusive international study camp in Hangzhou this July.
This program combines advanced learning, cultural exploration, and professional networking — with all local costs fully sponsored for selected international participants.
Hangzhou – Where Ancient Heritage Meets Future Innovation
Home to tech giants like Alibaba, Ant Group, and some of Asia’s top startups, Hangzhou is both the heart of China’s digital future and a guardian of its rich cultural legacy. Here, cloud computing exists alongside ancient Song Dynasty pagodas — a place where the future is built with wisdom from the past.
You can watch a short video about Hangzhou.
The summer camp program will take place near the Liangzhu Archaeological Site in Hangzhou, Zhejiang Province — a 5,300-year-old city and a UNESCO World Heritage Site.
At Beihang University, success is more than a goal — it’s a legacy. Ranked #1 in China for Aeronautics (ARWU), Beihang plays a key role in the development of the C919 aircraft, the Tianwen-1 Mars mission, and breakthroughs in quantum communication. Now also at the forefront of Artificial Intelligence and Robotics, Beihang leads cutting-edge research shaping the future of technology.
As part of China’s two most prestigious national initiatives — Project 985 and the Double First-Class Program — Beihang stands as a premier center of excellence.
Over 80% of PhD graduates go on to elite positions in Fortune 500 companies or academia, supported by 200+ industry partnerships. From smart materials to next-generation robotics, Beihang is where your ambition transforms into real-world impact.
Application Timeline
Application Period:
Now – 30 June 2026
Program Dates:
13 Jul – 26 Jul 2026
Program Structure:
Week 1:
Academic Activities
Week 2:
Chinese Language & Cultural Experience
Key Activities:
Choose a field that matches your interests!
Available Fields:
- AI Photonics
- Low-Carbon Technologies & Intelligent Energy Systems
- Embodied AI & Intelligent Systems
- Nanoelectronics Summer School
- Surface & Interface Science
- Model Predictive Control (MPC)
- Terahertz (THz + 6G + AI)
- Geometric Measure Theory
- Simulation Technology & Applications
- Multi-UAV Systems (LLM-driven perception)
- Engineering Medicine
- Future Aircraft
- Aviation Safety (Digital Intelligence)
- Advanced Materials
- Nature-Inspired Materials & Chemistry
- Formula Race Car: Design, Fabrication & Testing
Who can Apply?
Undergraduate/postgraduate students, lecturers, education professionals, or researchers aged 18–50 in good health.
Fully Sponsored:
BISS International Summer Program 2025
✅ Includes: Program course, accommodation, meals on campus, visa support (official invitation letter)
❌ NOT Included: flight tickets, visa fee, other personal expenses.
Elite Linguistic Academy success fee to cover document processing, coordination, and liaison with related parties:
SGD298 / pax
Fully refundable if the application is unsuccessful.
Application deadline: June 30, 2026
📝 Required Documents:
- Valid passport (valid for more than 6 months)
- Proof of enrollment or employment (university/workplace letter)
- Transcript (if available)
- Health certificate (if requested)
Documents can be submitted after initial registration.
